Equipment

Deposition reactors and thin-film characterization tools built and run by the group. Click a tile for details.

iCVDInitiated chemical vapor deposition

Plasma ALDPECVD / plasma-assisted atomic layer deposition

Multi-chamber deposition systemiCVD and PEALD without breaking vacuum

Molecular Layer Deposition (MLD)Photo: Lunghammer, TU Graz

EllipsometerPhoto: Lunghammer, TU Graz

Ellipsometric porosimetryOpen porosity of thin films

Water contact angle goniometerWetting and surface energy

Potentiostat / galvanostatEIS and cyclic voltammetry

FT-IR spectra deconvolutionOpen-source script on GitHub